| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film thickness correction method capable of obtaining a uniform coating film by correcting the thickness fluctuations of the coating film formed on the surface of a substrate by the so-called spinless coating, a film thickness correction apparatus, a coating apparatus and a heating device. <P>SOLUTION: The substrate W having a coating film formed on the surface thereof by the so-called spinless coating is placed and held on a hot plate 6. A film thickness correction mechanism 8 is moved while keeping a spaced-apart distance between a roller 28A and the surface of the substrate W constant. Since fluctuations in thickness is corrected by physical force by pressing the roller 28A to the entire surface of the coating film, the coating film uniform in film thickness can be obtained. Further, rollers 28A and 28B are prepared and replaced at each time when film thickness correction processing is performed. <P>COPYRIGHT: (C)2004,JPO |
