发明名称 MANUFACTURING METHOD FOR TRANSPARENT CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide an easy manufacturing method for a transparent conductive film provided with low electrical resistance and to provide the manufacturing method for the transparent conductive film producing a protective layer on the transparent conductive film by using organic metallic compound as processing liquid with reduction property. SOLUTION: In the manufacturing method for the transparent conductive film provided with low electric resistance value, the transparent conductive film is produced by curing in the environment where oxygen exists after coating the substrate with the processing liquid having conductive minute particles with an average diameter of≤50 nm as the processing liquid for a first layer. Then, the transparent conductive film is reduced by coating a processing liquid with reduction property on the film as a second layer processing liquid, being dried or cured after dried and the electric resistance value is lowered. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003281946(A) 申请公布日期 2003.10.03
申请号 JP20020082243 申请日期 2002.03.25
申请人 MITSUBOSHI BELTING LTD 发明人 ANEGAWA AKIKO;TSUTSUI YOSHIYA
分类号 C03C17/34;H01B13/00;(IPC1-7):H01B13/00 主分类号 C03C17/34
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