发明名称 EXPOSURE METHOD IN PHOTOLITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To solve the problem wherein focusing value changes over time during carrying out actual lot processing, even though the best focusing value is obtained in advance by carrying out test exposure in the conventional methods. SOLUTION: The calculation method for the best focusing value to form a desired pattern size has a step of calculating the change between the focus to form the pattern and the best focus by making an exposure, using the size difference of the first and second patterns obtained from a first pattern that does not change the size, even if the focus is changed and a second pattern that changes the size, when the focus is changed, both of them are the patterns formed in the past exposures, and a step of determining if the focus changes in the positive or negative focusing direction by using a third pattern which shows changes from the best focus. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003282395(A) 申请公布日期 2003.10.03
申请号 JP20020078396 申请日期 2002.03.20
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 FUKUMOTO HIROBUMI;IWAMOTO FUMIO
分类号 G03F7/207;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/207
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