| 摘要 |
PROBLEM TO BE SOLVED: To accurately transfer the pattern of a mask to a substrate, without being affected by a variation in optical characteristics of a laser beam even if the variation occurs. SOLUTION: By laser optical characteristic measuring apparatuses, (16c, 16e) the laser beam LB that is generated in a laser resonator (16a) is received for measuring optical characteristics, and at the same time, information on the optical characteristics is outputted. Then, by a main control apparatus 50, the amount of the accumulated energy of the laser beam (the amount of exposure in the substrate) given to the substrate based on the information is controlled at exposure. As a result, the amount of exposure in the substrate is adjusted corresponding to the optical characteristics of the laser beam. COPYRIGHT: (C)2004,JPO |
