| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist separation device which eliminates damage to a substrate, reduces waste liquid discharge, and accelerates separation without using toxic substances such as organic chemicals. SOLUTION: The device is provided with: a means for conveying the substrate having a resist to be removed; a means for irradiating an ultraviolet beam which is located on the conveying means and has a wavelength equivalent to that of a light source for exposing the resist; a water applying means which is disposed in the upstream of the ultraviolet irradiating means for forming a water screen on the surface of the resist on the substrate; and an ultraviolet- ray transmission plate which is fixedly disposed in the downstream of the ultraviolet-ray irradiating means for enabling planar junction with the conveyed substrate through the water screen which has been formed on the resist by the water coating means. COPYRIGHT: (C)2004,JPO |
