发明名称 METHOD OF AUTOMATICALLY CHANGING MASK LAYOUT DESIGN FOR ANALOG IC
摘要 PROBLEM TO BE SOLVED: To shorten the turn around time by automating processes, and to eliminate the generation of a careless miss due to the manual work when changing design to change a mask after an aluminizing process. SOLUTION: This method has each process for forming a custom groundwork of analog function blocks from components such as a bipolar, MOS transistor/resistor/ capacity, for dividing/wiring the elements to element structural components arranged in the custom groundwork, and for doing maintenance of connection between the elements divided into the custom groundwork. In the customer groundwork forming process, when description (realization formula) about the element structural components is set in a circuit figure, the custom groundwork forming process follows the realization formula, and when the realization formula is not set, a realization table is utilized to automatically generate the element structural components. In the element dividing/ wiring process, when the realization formula is set, the element dividing/wiring process follows the realization formula, and when the realization formula is not set, the elements are divided into the element structural components on the basis of the realization table to change the information about connection between the element structural components for wiring. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003281211(A) 申请公布日期 2003.10.03
申请号 JP20020082893 申请日期 2002.03.25
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TANAKA HIROYO;MITSUYASU HIROKO;KANETANI TAKESHI;KONISHI SHIGEAKI
分类号 G06F17/50;H01L21/82;H01L21/822;H01L27/04;H01L27/118;(IPC1-7):G06F17/50 主分类号 G06F17/50
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