| 摘要 |
PROBLEM TO BE SOLVED: To provide an electric charge donor which enables a pattern in microstructure to be formed on a semiconductor surface through a simple process and a fine pattern forming body. SOLUTION: Provided is the electric charge donor which has a strained region obtained by introducing strain into the crystal structure of the crystalline semiconductor surface and is characterized in that electric charges are imparted from the strained region. COPYRIGHT: (C)2004,JPO |
