发明名称 |
SEMICONDUCTOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To prevent the deterioration of hFE or the enlargement of an emitter area in a mesa-type bipolar transistor. SOLUTION: An emitter layer 5A is formed on a base layer 4A on a collector layer 3, and ion implantation or ashing is carried out on the surface of the outside region of an emitter electrode 7 in the emitter layer 5A so that a damaged layer 10 is formed. Thus, the high resistance of the surface of the outside region is obtained. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2003282581(A) |
申请公布日期 |
2003.10.03 |
申请号 |
JP20020083342 |
申请日期 |
2002.03.25 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
TSURUMI NAOHIRO;HIKITA MASAHIRO;YANAGIHARA MANABU;TANAKA TAKESHI |
分类号 |
H01L21/331;H01L21/265;H01L29/737;(IPC1-7):H01L21/331 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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