发明名称 SEMICONDUCTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To prevent the deterioration of hFE or the enlargement of an emitter area in a mesa-type bipolar transistor. SOLUTION: An emitter layer 5A is formed on a base layer 4A on a collector layer 3, and ion implantation or ashing is carried out on the surface of the outside region of an emitter electrode 7 in the emitter layer 5A so that a damaged layer 10 is formed. Thus, the high resistance of the surface of the outside region is obtained. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003282581(A) 申请公布日期 2003.10.03
申请号 JP20020083342 申请日期 2002.03.25
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TSURUMI NAOHIRO;HIKITA MASAHIRO;YANAGIHARA MANABU;TANAKA TAKESHI
分类号 H01L21/331;H01L21/265;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L21/331
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