| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which detects its apparatus- specific high-frequency characteristics for evaluating its process capability based on the detected high-frequency characteristics. <P>SOLUTION: A high-frequency current detector 11 of the plasma treatment apparatus 100 detects a high-frequency current generated when high-frequency power that does not generate plasma in a chamber 1 is fed to the chamber 1 by a high-frequency power source 10, and outputs the detected high-frequency current to a computer 12. The computer 12 compares the high-frequency current received from the high-frequency current detector 11 with a reference high-frequency current. If both the high-frequency currents agree with each other, the process performance of the plasma treatment apparatus 100 is evaluated as being normal, but if the both do not agree, the process performance is evaluated to be abnormal. <P>COPYRIGHT: (C)2004,JPO |
