发明名称 |
THIN FILM, MANUFACTURING METHOD OF THIN FILM, THIN FILM MANUFACTURING DEVICE, ORGANIC EL DEVICE, MANUFACTURING METHOD AND MANUFACTURING DEVICE THEREOF, AND ELECTRONIC APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To prevent vapor of a solvent from being brought to a succeeding process after a thin film layer is made from a solution containing a film formation constituent and the solvent. <P>SOLUTION: The thin film is made from the solution containing the thin film formation constituent and the solvent, and the atmosphere in the vicinity of the thin film is set to 1 Pa or below at ordinary temperature to remove solvent molecules from the thin film until making a condition where no solvent molecule is substantially present in the atmosphere. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2003282244(A) |
申请公布日期 |
2003.10.03 |
申请号 |
JP20020079508 |
申请日期 |
2002.03.20 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MORII KATSUYUKI |
分类号 |
H05B33/10;H01J9/00;H01L27/32;H01L51/00;H01L51/50;H01L51/56;H05B33/14 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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