发明名称 THIN FILM, MANUFACTURING METHOD OF THIN FILM, THIN FILM MANUFACTURING DEVICE, ORGANIC EL DEVICE, MANUFACTURING METHOD AND MANUFACTURING DEVICE THEREOF, AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To prevent vapor of a solvent from being brought to a succeeding process after a thin film layer is made from a solution containing a film formation constituent and the solvent. <P>SOLUTION: The thin film is made from the solution containing the thin film formation constituent and the solvent, and the atmosphere in the vicinity of the thin film is set to 1 Pa or below at ordinary temperature to remove solvent molecules from the thin film until making a condition where no solvent molecule is substantially present in the atmosphere. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003282244(A) 申请公布日期 2003.10.03
申请号 JP20020079508 申请日期 2002.03.20
申请人 SEIKO EPSON CORP 发明人 MORII KATSUYUKI
分类号 H05B33/10;H01J9/00;H01L27/32;H01L51/00;H01L51/50;H01L51/56;H05B33/14 主分类号 H05B33/10
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