| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus where alignment is easy and reliable, and to provide a device-manufacturing method. SOLUTION: A lithographic projection apparatus has an alignment sensor comprising an electron beam supply source 10 for supplying an electron beam 12 for impinging on an alignment mark 14 on a substrate W, and a back- scattered electron detector 16 for detecting electrons being back-scattered from the alignment marker 14. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor. COPYRIGHT: (C)2004,JPO
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