Plasma processing apparatus

摘要

A plasma processing apparatus includes a generator for producing a first microwave. The apparatus includes a slot antenna for receiving the first microwave to radiate a second microwave in a shape. The apparatus includes a dielectric window for receiving the second microwave to produce surface-wave plasma. The apparatus includes a conveyor for an object to pass in proximity to the dielectric window. The apparatus includes a transmitting path for transmitting the first microwave in a direction. The apparatus includes a coaxial converter provided to a front end of the transmitting path. The coaxial converter includes an internal conductor for converting the first microwave from the direction into an orthogonal direction relative to the transmission path. The apparatus includes a discharging chamber provided to the dielectric window.