发明名称 |
Film substrate treatment apparatus, film substrate treatment method, and film substrate transport method |
摘要 |
To provide a film substrate treatment apparatus that appropriately mounts film substrates on an electrostatic adsorption stage. In the film substrate treatment apparatus, adsorption pads are disposed on the first adsorption units that mount film substrates on an electrostatic stage, and a pressing member that presses the edge portion areas of the film substrates against the stage is provided. The film substrates can thereby be reliably attached to the stage, and the film substrates can be appropriately treated in a decompressed atmosphere.
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申请公布号 |
US2003183339(A1) |
申请公布日期 |
2003.10.02 |
申请号 |
US20030403081 |
申请日期 |
2003.04.01 |
申请人 |
MATSUSHITA ELEC IND CO LTD |
发明人 |
SASAOKA TATSUO;SUZUKI NAOKI;YONEZAWA TAKAHIRO;HORIE SATOSHI |
分类号 |
C08J7/00;H01L21/683;H05K3/34;H05K3/38;(IPC1-7):C23F1/00 |
主分类号 |
C08J7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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