METHOD FOR COATING A SUBSTRATE AND DEVICE FOR CARRYING OUT THE METHOD

摘要

The invention relates to a method and a device for coating at least one substrate with a thin layer in a processing chamber (2) of a reactor (1). A solid or liquid starting material (15) stored at least in a reservoir (12) is guided into the processing chamber (2) as a gas or an aerosol by means of a carrier gas, where it is condensed on the substrate (3). The solid or liquid starting material (15) is maintained at a source temperature which is higher than the substrate temperature. In order to enable a targeted adjustment of the composition, sequence of layers and properties of the contact surface which determine the properties of the components, the carrier gas flows through the starting material (15) and the supply of the gaseous starting material to the processing chamber (2) is controlled by means of at least one valve (8) and one mass flow regulator (9).