| 摘要 |
<p>The method comprises the steps of applying a masking agent at part of a surface of the substrate, depositing the coating film over at least part of the surface of the substrate which is covered by the masking agent and over at least part of the surface of the substrate which is free of the masking agent and removing the masking agent from the substrate. The masking agent is preferably removed by the application of water.</p> |
