| 发明名称 |
Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio |
| 摘要 |
A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).
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| 申请公布号 |
US2003186171(A1) |
申请公布日期 |
2003.10.02 |
| 申请号 |
US20030377705 |
申请日期 |
2003.03.04 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
NAKAMURA TSUYOSHI;IKEGAWA TAEKO;SAWANO ATSUSHI;DOI KOUSUKE;KOHARA HIDEKATSU |
| 分类号 |
C08F220/18;C08F222/06;C08F230/08;C08K5/41;C08L35/00;G03F7/039;G03F7/075;G03F7/40;H01L21/027;(IPC1-7):G03F7/30 |
主分类号 |
C08F220/18 |
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