| 摘要 |
A chemical etching system is disclosed. The controlling unit has programmable electronic device, when it is inputted various parameters, controlling unit can control etching liquid supply unit and gas supply unit. Etching liquid supply unit provide suitable etching atmosphere to cooperate with etching liquid supply unit and gas supply unit, and provide an etching stage. Controlling unit can control flow valves and electromagnetic valves of etching liquid supply unit, and adjust flow and switches of etching liquid. Controlling unit can control flow valves and electromagnetic valves of gas supply unit, and adjust flow and switches of injected gas stream.
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