| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stable antireflection member having a low reflectance at a low cost by performing antireflection treatment simultaneously with forming of a substrate. <P>SOLUTION: An uneven face composed of continuous patterns of minute pyramidal projections 10 is formed on the surface of a translucent substrate 1. The uneven face composes zero-order refractive face to visible light, and pattern of the uneven face is formed at a transfer ratio of 70% or greater of the pattern of a die. <P>COPYRIGHT: (C)2004,JPO |
