ENERGY EFFICIENT METHOD FOR GROWING POLYCRYSTALLINE SILICON
摘要
Polysilicon dendrites are grown by depositing silicon on a polysilicon rod or other substrate. Surface temperature is increased to a temperature at which needle-like dendrites (120) develop due to the deposition of silicon from silicon-containing molecules in the surrounding reactor atmosphere. Thereafter, the surface temperature is gradually reduced so that silicon that deposits on the needle-like (120) dendrites causes the dendrites to grow and assume a generally flared shape.
申请公布号
WO03069027(A3)
申请公布日期
2003.10.02
申请号
WO2003US04360
申请日期
2003.02.13
申请人
ADVANCED SILICON MATERIALS LLC;WINTERTON, LYLE, C.;HILL, JOHN, PETER