发明名称 SYSTEM FOR ANALYZING AND CONTROLLING AUTOMATICALLY LOSS FACTOR IN INSPECTION PROCESS FOR SEMICONDUCTOR IC ELEMENT, AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a system and a method for automatically analyzing and controlling a loss factor generated in an inspection process. SOLUTION: Original data are generated in real time in each of a plurality of inspection cycles by progress of the inspection process (51). Inspection time data and an index time data are generated based on the original data in the each of the plurality of inspection cycles (52). Loss time data are calculated thereafter based on the generated original data, inspection time data and index time data (53), and inspection process data are generated using the calculated data, and stored (54). Then, the stored inspection process data are analyzed (55) to be output to a user interface. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003279626(A) 申请公布日期 2003.10.02
申请号 JP20020137569 申请日期 2002.05.13
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 LEE KYU SUNG;CHUNG AE YONG;KIM SUNG OK
分类号 G01R31/26;G01R31/28;G06F17/00;(IPC1-7):G01R31/28 主分类号 G01R31/26
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