发明名称 |
In-situ local heating using megasonic transducer resonator |
摘要 |
An apparatus for cleaning a semiconductor substrate is provided. In embodiment of the present invention, a megasonic cleaner capable of providing localized heating is provided. The megasonic cleaner includes a transducer and a resonator. The resonator is configured to propagate energy from the transducer. The resonator has a first and a second end, the first end is operatively coupled to the transducer and the second end is configured to provide localized heating while propagating the energy from the transducer. A system for cleaning a semiconductor substrate through megasonic cleaning and a method for cleaning a semiconductor substrate is also provided.
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申请公布号 |
US2003183246(A1) |
申请公布日期 |
2003.10.02 |
申请号 |
US20020112639 |
申请日期 |
2002.03.29 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BOYD JOHN M.;MIKHAYLICH KATRINA |
分类号 |
H01L21/304;B08B3/02;B08B3/10;B08B3/12;H01L21/00;H01L21/306;(IPC1-7):C25F1/00 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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