| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection optical system, an exposure device, a device manufacturing method and a device bringing a desired optical performance by correcting the influence of residual intrinsic birefringence. SOLUTION: The projection optical system is provided with a plurality of elements constituted of an optical crystal material indicating intrinsic birefringence in an exposure wavelength and arrangement to an optical axis of the crystal axis of the elements is optimized so as to minimize the influence of the intrinsic birefringence. A birefringence correction member for correcting the influence of the intrinsic birefringence remaining after the assembly of the projection optical system is arranged inside the projection optical system. COPYRIGHT: (C)2004,JPO
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