| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition capable of enhancing basic performances such as sensitivity and resolution, particularly isolated resolution without lowering the proportion of a residual film. <P>SOLUTION: The chemically amplified positive resist composition comprises (A) a resin which has a phenol skeleton and is insoluble or slightly soluble itself in an aqueous alkali solution but has a protective group cleavable by the action of an acid and becomes soluble in an aqueous alkali solution after cleavage of the protective group, (B) a resin obtained by protecting part of the hydroxyl groups of poly(p-hydroxystyrene) with pivaloyl groups and (C) an acid generator. <P>COPYRIGHT: (C)2004,JPO |
