CONTINUOUS HEAT TREATMENT FURNACE

摘要

PROBLEM TO BE SOLVED: To provide a continuous heat treatment furnace for heat-treating a large glass substrate such as a glass substrate for a plasma display panel, enabling reduction of installation area as compared with the conventional furnace.

SOLUTION: In this continuous heat treatment furnace, the large glass substrate placed on a setter is moved and simultaneously heat-treatment such as temperature rise, soaking retention and annealing is performed according to a desired temperature curve. In an area 21 for temperature rise and an area 25 for annealing, the large glass substrate 1 placed on the setter 3 is moved in the vertical direction and simultaneously heat treatment is performed.

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