发明名称 METHOD AND APPARATUS FOR PROVIDING A LAYER OF COMPRESSIVE RESIDUAL STRESS
摘要 The shot peening method and apparatus (Fig. 13) of the present invention utilizes control of the shot peening coverage to provide higher surface compression and comparable depth of compression to conventional 100% coverage peening but with reduced cold working providing improved thermal stability and reduction in shot peening time and cost. A preferred embodiment of this invention employs x-ray diffraction (Fig. 13) residual stress and percent cold work determinated by line broadening to establish the optimal degree of coverage for a given material and shot peening intensity.
申请公布号 WO03080877(A1) 申请公布日期 2003.10.02
申请号 WO2003US08130 申请日期 2003.03.14
申请人 SURFACE TECHNOLOGY HOLDINGS, LTD.;PREVEY, PAUL, S., III;CAMMETT, JOHN, T. 发明人 PREVEY, PAUL, S., III;CAMMETT, JOHN, T.
分类号 C21D7/06;(IPC1-7):C21D7/06 主分类号 C21D7/06
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