| 摘要 |
An exposure apparatus has an exposure laser light source, a detection laser light source, a converging lens assembly, detector and a controller. The exposure laser light source emits an exposure laser beam. The detection laser light source emits a detection laser beam. The converging lens assembly receives the exposure laser beam and the detection laser beam, and is disposed in a near-field region of the exposure surface of a negative. The detector detects a linearly polarized component of a detection laser beam reflected off the distal end surface of the converging lens assembly. The controller controls the distance between the distal end surface of the converging lens assembly and the exposure surface on the basis of a detection signal from the detector.
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