摘要 |
An electron beam exposure apparatus for exposing a pattern to a wafer by a plurality of electron beams, comprising an electron beam generating section for generating a plurality of electron beams, a deflecting section having a plurality of deflectors for deflecting the plurality of electron beams, and a screening section having a first screen electrode disposed between the plurality of deflectors and extending from a position close to the electron beam generating section from one end of the deflector to a position close to the wafer from one end of the deflector along the direction of radiation of electron beams.
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