发明名称 |
SYNTHETIC QUARTZ GLASS MEMBER AND PROCESS FOR PRODUCING THE SAME |
摘要 |
<p>A process for producing a quartz glass member, wherein a sample from a quartz glass base material is exposed to F2 laser under given conditions and whether or not the peak intensity of H2 Raman scattering radiation is decreased by 80% or more from the peak intensity of H2 Raman scattering radiation with respect to a sample not exposed to F2 laser is judged. When the decrease of the peak intensity of H2 Raman scattering radiation is less than 80%, the laser resistance of the quartz glass base material is judged as being satisfactory, and a synthetic quartz glass member is worked from the base material. The compaction of the sample is also measured.</p> |
申请公布号 |
WO03080525(A1) |
申请公布日期 |
2003.10.02 |
申请号 |
WO2003JP03618 |
申请日期 |
2003.03.25 |
申请人 |
NIKON CORPORATION;MIZUGUCHI, MASAFUMI;FUJIWARA, SEISHI;KOMINE, NORIO |
发明人 |
MIZUGUCHI, MASAFUMI;FUJIWARA, SEISHI;KOMINE, NORIO |
分类号 |
C03B19/14;C03C3/06;C03C23/00;(IPC1-7):C03C3/06;C03B20/00 |
主分类号 |
C03B19/14 |
代理机构 |
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代理人 |
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地址 |
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