| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an image forming exposure system and a work positioning method, wherein a work can be placed flatly on a work mount and quickly and accurately positioned even if it is warped. SOLUTION: A work W is pressed down on a work mount 5 by a pressure operation mechanism 15 of a retreatable work mounting means 4, and the work W is flatly fixed onto the work mount 5 by vacuum-suction through a vacuum- suction mechanism 7. Thereafter, the work W is picked up by a retreatable first image sensor 33, the picked-up image A1 and reference image A2 of the work W are set coincident with each other to preliminarily position the wafer W, and then the wafer W is positioned on the basis of the projection mark M1 of a mask M.</p> |
