| 摘要 |
<p>A vacuum deposition apparatus which deposits a deposition material on an object in a vacuum atmosphere includes: an exhaust unit (115, 127a, 127b) which discharges gas from an inside of the apparatus; a plurality of deposition units (122a, 122b, 123a, 123b, 124a, 124b) which evaporate the deposition material by heating to deposit the material on the object respectively, each deposition unit being disposed in separate chambers in the apparatus individually; and an opening and closing unit (125, 126) which selectively opens and closes each chamber. <IMAGE></p> |
