发明名称 METHOD AND APPARATUS FOR DEFINING MASK PATTERNS UTILIZING SPATIAL FREQUENCY DOUBLING TECHNIQUE
摘要 A method of generating a mask for use in printing a target pattern on a substrate. The method includes the steps of: (a) determining a target pattern representing a circuit design to be printed on a substrate; (b) generating a first pattern by scaling the target pattern by a factor of 0.5; and (c) generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The second pattern is then utilized to print the target pattern on the substrate. <IMAGE>
申请公布号 KR20030077448(A) 申请公布日期 2003.10.01
申请号 KR20030018564 申请日期 2003.03.25
申请人 发明人
分类号 H01L21/027;G03F1/00;G03F7/20;G06F17/50 主分类号 H01L21/027
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