发明名称 |
METHOD AND APPARATUS FOR DEFINING MASK PATTERNS UTILIZING SPATIAL FREQUENCY DOUBLING TECHNIQUE |
摘要 |
A method of generating a mask for use in printing a target pattern on a substrate. The method includes the steps of: (a) determining a target pattern representing a circuit design to be printed on a substrate; (b) generating a first pattern by scaling the target pattern by a factor of 0.5; and (c) generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The second pattern is then utilized to print the target pattern on the substrate. <IMAGE> |
申请公布号 |
KR20030077448(A) |
申请公布日期 |
2003.10.01 |
申请号 |
KR20030018564 |
申请日期 |
2003.03.25 |
申请人 |
|
发明人 |
|
分类号 |
H01L21/027;G03F1/00;G03F7/20;G06F17/50 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|