发明名称 RESIST COMPOSITION AND PRODUCTION OF SEMICONDUCTOR DEVICE USING SAME
摘要 PROBLEM TO BE SOLVED: To enable development without using harmful chemicals by incorporat ing a specified compd., an optical acid generating agent which generates an acid when irradiated with light and a solvent. SOLUTION: This compsn. contains a homo- or co-polymer contg. repeating units represented by the formula, an optical acid generating agent which generates an acid when irradiated with light and a solvent dissolving a polymer and the optical acid generating agent. In the formula, one of X<1> -X<4> is -OR<1> , -COOR<1> or -R<2> -OR<1> (R<1> is hydrocarbon released by an acid and R<2> is divalent hydrocarbon or a group obtd. by substituting an atom such as halogen, Si or Ti or an atomic group consisting of such atoms for part of a hydrocarbon group), another is -COR<3> (R<3> is hydrocarbon or a group obtd. by substituting an atom such as halogen, Si or Ti or an atomic group consisting of such atoms for part of a hydrocarbon group) and the remaining two are H.
申请公布号 JPH09258448(A) 申请公布日期 1997.10.03
申请号 JP19960063439 申请日期 1996.03.19
申请人 FUJITSU LTD 发明人 KODACHI AKIKO
分类号 G03F7/004;G03F7/039;G03F7/32;G03F7/38;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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