| 摘要 |
PURPOSE: A scan type doping device is provided to carry out the doping of a substrate while changing the positions of upper and lower parts of the substrate by a rotation driving element mounted to a platen, thereby resolving the ununiformity of the doping according to the position of the substrate. CONSTITUTION: A scan type doping device includes a housing(410) for providing a process chamber(420) for doping a substrate, a load-lock chamber(440) for moving the substrate to dope into the process chamber, and a source part(450) for accelerating doping ions to scan the doping ion in the shape of ion beams into the processing chamber. A reciprocating assembly(421) is provided in the process chamber, and includes a loading part for securing the substrate, a rotation assembly for rotating the loading part in a predetermined direction, and a platen(421c) for supporting the loading part and the rotation assembly. The reciprocating assembly carries out primary doping by reciprocating the substrate to impact the ion beams by a predetermined line to the substrate and secondary doping by reciprocating the substrate. |
