| 摘要 |
A method for manufacturing an observation apparatus by which the residual aberration including a high-order aberration component of the wavefront aberration can be corrected favorably. A method for manufacturing an observation apparatus for observing an image of the surface (WH) to be inspected formed by way of an image-forming optical system (7, 6, 10, 11, 12(14)). The methods include an aberration measuring step of measuring the residual aberration remaining in the image-forming optical system, and an installing step of installing a correction plate (17), at least one of the surfaces of which is processed to be aspheric form, at a predetermined position in the optical path of the image-forming optical system. <IMAGE>
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