发明名称 LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program
摘要 A computer implemented method for LSI mask manufacturing stores performance information of a lithography unit, connected to a network, in a lithography unit database. The method receives a lithography data and a lithography reservation condition from a user terminal connected to the network. The method stores the lithography data in a lithography data database. The method searches for a lithography unit matching to the lithography reservation condition, generating a list of lithography units, and sending the list to the user terminal. In addition, the method receives information of a lithography unit specified by the user terminal and sending a lithography request to the lithography unit specified by the user terminal. <IMAGE>
申请公布号 EP1349091(A2) 申请公布日期 2003.10.01
申请号 EP20030006732 申请日期 2003.03.25
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KOYAMA, KIYOMI
分类号 G03F1/36;G03F1/68;G06F17/50;G06Q30/06;G06Q50/00;G06Q50/04;H01L21/027 主分类号 G03F1/36
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