发明名称 METHOD FOR MACHINING SILICON, INK JET HEAD PRODUCTION SYSTEM, INK JET HEAD, INK JET RECORDER, INK JET RECORDING METHOD, SYSTEM AND METHOD FOR PRODUCING COLOR FILTER, SYSTEM AND METHOD FOR PRODUCING FIELD EMISSION SUBSTRATE, AND SYSTEM AND METHOD FOR PRODUCING MICROARRAY
摘要 <p><P>PROBLEM TO BE SOLVED: To obtain a method for machining silicon in which the yield of ink jet head can be increased by suppressing occurrence of micro defects at the time of machining a silicon substrate, and a recorder, e.g. a printer, a color filter production system, a field emission substrate production system, and the like, employing an ink jet head produced by that method. <P>SOLUTION: After metals adhering to the silicon surface are removed by SC-2 cleaning, or the like, the silicon is heat treated and machined. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003276208(A) 申请公布日期 2003.09.30
申请号 JP20020080460 申请日期 2002.03.22
申请人 SEIKO EPSON CORP 发明人 YAMAZAKI SEIJI
分类号 B41J2/01;B41J2/16;G02B5/20;(IPC1-7):B41J2/16 主分类号 B41J2/01
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