| 摘要 |
A photomask, on which a transfer pattern is formed, for being irradiated with a predetermined exposure beam, and methods for making and using the photomask and an apparatus for practicing the methods, the mask having a pattern surface on which the pattern is formed and a substrate being transparent with respect to the exposure beam, having a predetermined thickness, and being disposed such that the substrate is separated from the pattern surface at a predetermined distance via a supporting member.
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