发明名称 |
Exposure apparatus, method for exposure, and method for manufacturing semiconductor device |
摘要 |
Changes transmittance of an optical system used to expose a substrate are determined and used to control an exposure quantity of exposing light that is provided to the substrate. For example, the transmittance is measured before and after exposure of one surface in order to control the exposure quantity that is to be used to expose another surface.
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申请公布号 |
US6628371(B1) |
申请公布日期 |
2003.09.30 |
申请号 |
US20000679390 |
申请日期 |
2000.10.05 |
申请人 |
NIKON CORPORATION |
发明人 |
ISHIKAWA JUN |
分类号 |
H01L21/027;G03B27/72;G03F7/20;(IPC1-7):G03B27/72;G03B27/42;G03B27/32;A61N5/00;G03F9/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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