发明名称 BEAM PROFILE MEASURING METHOD AND LASER BEAM PROCESSING EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To directly evaluate the distribution of beam intensity in the direction of the cross section by projecting the beam on a screen in an laser beam irradiation using an aperture. <P>SOLUTION: An aperture A is narrowly set up so that a reflection image from the surface of a half mirror 3 and a reflection image from the rear surface of a half mirror are separated because these image sometimes overlap to cause interference. Then, images are formed on an imaging surface 41 while sequentially moving the narrow aperture A, only either kind of the reflection images is selected from the formed images, and the selected images are combined on a display screen 6. Accordingly, the more accurate profile of a laser beam irradiation spot from which the overlap of the images and the influence of the light interference are eliminated can be measured. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003275887(A) 申请公布日期 2003.09.30
申请号 JP20020079238 申请日期 2002.03.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KOBAYASHI MASAYOSHI
分类号 G01B11/24;B23K26/02;B23K26/03;(IPC1-7):B23K26/02 主分类号 G01B11/24
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