| 摘要 |
An apparatus for treating waste gas from semiconductor manufacturing process includes a decomposition chamber having an inner wall and having a heater therein, a cleansing chamber and a waste water treating device; the inner wall of the decomposition chamber being mounted with a temperature sensor for servo control of the heater to operate at a constant temperature, and an aluminum foil layer to reflect heat to shorten decomposition time, the bottom end of the decomposition chamber being mounted with a detachable dust collector; the top section of the cleansing chamber being provided with a plurality of short metallic tubes to allow condensation of residual moisture of the discharged gas on the wall of the short metallic tubes, and the waste water treating device included a G-shaped tank mounted with a slurry removing device comprising a conveyor, a driving shaft, a driven shaft, a combing roller, a scrape board, and a speed-reducing motor, thereby precipitated slurries at the bottom of a storage tank is discharged.
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