发明名称 |
Ultraviolet and vacuum ultraviolet antireflection substrate |
摘要 |
An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength lambd0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate
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申请公布号 |
US6628456(B2) |
申请公布日期 |
2003.09.30 |
申请号 |
US20020138558 |
申请日期 |
2002.05.06 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
TAKAKI SATORU;OKADA KANAME;KIKUGAWA SHINYA |
分类号 |
G02B1/10;G02B1/11;G03F1/00;G03F1/14;G03F1/46;G03F1/62;G03F7/20;(IPC1-7):G02B5/08 |
主分类号 |
G02B1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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