| 摘要 |
A CVD device (100) includes a 142 process chamber (102), in the wall of which first to fourth cartridge heaters (146, 148, 150, 152) are buried. The heaters have resistance whose value increases with temperature. A heater controller (160) determines the heater resistance from the current and voltage values associated with each heater. The heater controller (160) corrects a reference resistance corresponding to a set temperature by using a correction value corresponding to the temperature detected by a temperature sensor (250), and multiplies the corrected reference resistance by the temperature distribution constant of each heater to determine the target resistance. The heater controller (160) properly controls the phase of the AC power supplied to each heater so that the heater resistance may follow the target resistance. The first to fourth cartridge heaters (146, 148, 150, 152) are thus controlled accurately.
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