| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an adhesion base plate for polishing a substrate to polish a highly flat substrate with high reproducibility. <P>SOLUTION: The base plate for polishing a substrate is formed that the back surface of a substrate 1 to be polished is disposed on one main surface of a base plate B, having a high position adhesion surface 2 and a low position non-adhesion surface 3, through an adhesion member. A ratio occupied by the area of the low position non-adhesion surface 3 on the surface, opposed to the back surface of the substrate 1, of the substrate 1 to be polished is 20-90%. <P>COPYRIGHT: (C)2003,JPO |
