| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an ink jet head at a low cost by taking advantage of anisotropic etching capable of micromachining a silicon single crystal substrate with high accuracy and sand blast etching for boring holes through the silicon substrate. SOLUTION: In the method for producing an ink jet head comprising a nozzle plate 1 provided with a plurality of nozzles 2, a channel plate 3 provided with tubes 6 communicating with the nozzles 2 and pressurized liquid chambers 4, and a diaphragm 7 for pressurizing liquid in the pressurized liquid chamber 4, the channel plate 3 is formed of a silicon substrate having a face orientation of (100). In a first process, a silicon nitride film is formed as a mask pattern from the pressurized liquid chamber side and anisotropic wet etching is performed at a depth required for the pressurized liquid chamber 4. In this regard, the interconnecting tube 6 part is also processed. In a second process, sand blast etching is performed from the nozzle surface side in a mask pattern formed of a dry film and then through holes communicating with the pressurized liquid chambers are made thus completing the ink jet head. COPYRIGHT: (C)2003,JPO
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