| 摘要 |
PURPOSE:A method for depositing a passivation film of a liquid crystal display is provided to protect array layers in a work of cleaning a photoresist film by depositing a passivation film through two steps. CONSTITUTION:An amorphous silicon film and a doped amorphous silicon film are deposited on a transparent insulating substrate where gate bus lines and a gate insulating film are formed, and the amorphous silicon film and the doped amorphous silicon film are etched to form an active layer. A metal film is deposited on the insulating substrate and is etched to form source and drain electrodes, and data bus lines. The insulating substrate is loaded to a PECVD(Plasma Enhanced Chemical Vapor Deposition) chamber for depositing a first passivation film by plasma particles for a certain time, and a power is turned off for a certain time to stop growth of the first passivation film. Power source is applied to the PECVD chamber for forming plasma ion(34) to form a second passivation film on the first passivation film. An ITO(Indium Tin Oxide) metal is deposited on the array substrate(35) and is etched to form pixel electrodes. |
