| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive composition adaptable for ultra-fine pattern formation utilizing radiation of laser rays, ultraviolet rays or X-rays by containing an acid generating agent generating acid via radiation illumination, a polymer protected with the phenol hydroxy group or carboxylic acid group of an alkali-soluble polymer, and a water generating agent generating water when reacted with acid. SOLUTION: This positive radiation-sensitive composition contains an acid generating agent generating acid via radiation illumination, a polymer protected with the phenol hydroxy group or carboxylic acid group of an alkali-soluble polymer, and a water generating agent generating water when reacted with acid. The water generating agent selectively generates water at a radiation illumination section when reacted with the acid generated by the radiation illumination and increases the diffusion of acid at the radiation illumination section. An alcohol compound efficiently generating water via a dehydration reaction in a molecule or between molecules by an acid catalyst can be used for the water generating agent. Secondary alcohol or tertiary alcohol is preferably used within the alcohol compound because of its high reactivity with acid. |
