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发明名称
PHOTOACID-LABILE POLYMER AND PHOTORESIST COMPRISING THE SAME
摘要
申请公布号
KR20030076211(A)
申请公布日期
2003.09.26
申请号
KR20020084759
申请日期
2002.12.27
申请人
发明人
分类号
G03F7/004;G03F7/039;H01L21/027
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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