| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To remarkably reduce processing time of a mask pattern data in producing a stencil mask. <P>SOLUTION: A size of a subfield and a width of a pole in a stencil mask are input as parameters, a division line for dividing a pattern data with keeping a hierarchical structure into the subfields is marked, and the pattern is divided into the subfields. Then, a position of the pattern is moved only by a width of a pole, among wholly expanded expansion patterns, a position of the division line is moved to solve a donut problem or a leaf problem, the pattern data divided for a subfield is expanded, detection of the donut problem or the leaf problem is performed for each pattern within each subfield with respect to a hierarchical structure cell, and the detected point is sorted in a complementary mask. <P>COPYRIGHT: (C)2003,JPO</p> |
