发明名称 METHOD AND APPARATUS FOR CONTROLLING FREQUENCY CHARACTERISTIC OF PIEZOELECTRIC ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a novel method and an apparatus available therefor, by which the precision or reproducibility of frequency characteristics is sufficiently secured and also a processing efficiency is improved when controlling the frequency of a piezoelectric element such as a surface acoustic wave element. <P>SOLUTION: In the first step of an etching process, a rough control step is carried out on the condition that an etching rate becomes comparatively high. In a rough control step Ts1, power to be supplied from a power circuit 18 to discharging electrodes 12 and 14 is increased. During such etching, a detector 17 measures the resonance frequency of a piezoelectric element 21 and sends output data to a controller 20. When the characteristic frequency reaches a prescribed value Fs, the rough control step Ts1 is ended and the controller 20 sends a switching control signal to the power source circuit 18 to lower the power to be supplied from the power source circuit 18, and to start a fine control step Ts2 for performing etching at the etching rate smaller than said rough control step. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003273681(A) 申请公布日期 2003.09.26
申请号 JP20020069156 申请日期 2002.03.13
申请人 SEIKO EPSON CORP 发明人 YAMAZAKI TADASHI;TAKAYAMA KATSUMI
分类号 H01L41/09;H01L41/18;H01L41/187;H01L41/22;H01L41/253;H01L41/332;H03H3/04;H03H3/10 主分类号 H01L41/09
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