发明名称 SEMICONDUCTOR DEVICE FOR PROTECTING ELECTROSTATIC DISCHARGE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device for protecting electrostatic discharge. SOLUTION: This semiconductor device includes a second conductive heavily doped area (170) and a vertical lightly doped area (500) surrounding the heavily doped area formed on a gate electrode (130) disposed on a first conductive semiconductor substrate (100) and the semiconductor substrate at both the sides of the gate electrode. The impurity concentration and depth of the vertical lightly doped area are respectively set so as to be lower and deeper than those of the heavily doped area. It is desired that a horizontal low concentration area (140) whose impurity concentration is lower than that of the vertical lightly doped area is further disposed on the upper side face of the vertical lightly doped area. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003273353(A) 申请公布日期 2003.09.26
申请号 JP20030038271 申请日期 2003.02.17
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 HO GENRYO;BOKU KEIRAI
分类号 H01L27/04;H01L21/336;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L27/04
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